| 摘要 |
PROBLEM TO BE SOLVED: To provide a ceramic heater excellent in soaking property of a wafer holding surface, and preferable for use in such as a manufacturing device of a semiconductor and the like and a liquid crystal manufacturing device. SOLUTION: The ceramic heater comprises a plate-like ceramic sintered body 1 having a heating resistor 2 formed thereon, wherein a dispersion of a pullback length L between an external peripheral 1a of the ceramic sintered body and an external peripheral edge 2a of a substantial area of the heating resistor is set within±0.8%, and a soaking performance of an entire surface of the wafer holding surface is set within±1.0%. The dispersion of the pullback length L is preferably set within±0.5%, to achieve an excellent soaking performance of±0.5% or less. COPYRIGHT: (C)2004,JPO
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