LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus for reducing causes of beam strength loss. SOLUTION: An opening that passes through a barrier is provided, for separating two parts of the apparatus, whereby a controlled aperture is constituted so that a pulse of radiation can be radiated from one part of the apparatus to the other. The controlled aperture closes the opening between the pulses of radiation to minimize the gas flow between the first and the second parts. COPYRIGHT: (C)2004,JPO