| 摘要 |
PROBLEM TO BE SOLVED: To provide a compact ion injection device realizing a uniform ion injection on a wafer and capable of accurately measuring charge potential volume on the surface of the wafer. SOLUTION: The device is provided with a disk 11 arranged in a vacuum chamber for supporting a wafer W, a rotating drive mechanism 13 for driving the disk 11 for rotation, a scanning mechanism 17 for moving the disk 11 back and forth in one direction, an ion injection part 20 for injecting ions on the surface of the wafer W at a part of a periphery of the disk 11, a charge sensor 22 measuring a charge potential volume on the surface of the wafer W at a different part of the periphery of the disk 11, and a control means 40 computing the charge potential volume only on the surface part of the wafer W according to a charge potential volume measured by the charge sensor 22 and a volume of the back-and-forth movement of the disk and the wafer obtained from the scanning mechanism 17. COPYRIGHT: (C)2004,JPO
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