| 摘要 |
PURPOSE: A wafer transfer system of photolithography process equipment is provided to be capable of easily removing particles on the surface of a wafer while transferring the wafer, for restraining focusing failure generated when carrying out a photolithography process and simultaneously increasing the manufacturing yield of a semiconductor device. CONSTITUTION: A wafer transfer system of photolithography process equipment is provided with a stage(30) for transiently adsorbing and supporting a wafer under a transferring process, a pipe type body part(34) spaced apart from the peripheral portion of the stage for transmitting vacuum pressure, and a dish part(36) prolonged from the upper portion of the body part. At this time, the stage includes a plurality of adsorbing ports(32). Preferably, the body part and the dish part are formed as one piece.
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