EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PURPOSE: An exposure apparatus and method for manufacturing a semiconductor device are provided to be capable of obtaining optimal exposure conditions by using selectively a revolver according to desired coherence. CONSTITUTION: An exposure apparatus comprises a splitter(22), light receiving sensors(S1,S1) and a display unit(24). The splitter(22) splits the light emitted from a projection lens(16). The light receiving sensors(S1) receive the split light. The display unit(24) converts the received light and displays the difference of frequency or voltage value. An oscilloscope is used as the display unit(24).