发明名称 Method of inspecting circuit pattern and inspecting instrument
摘要 In order to obtain optimum irradiation conditions of an electron beam according to the material and structure of a circuit pattern to be inspected and the kind of a failure to be detected and inspect under the optimum conditions without delay of the inspection time, an inspection device for irradiating the electron beam 19 to the sample board 9 which is a sample, detecting generated secondary electrons by the detector 7, storing obtained signals sequentially in the storage, comparing the same pattern stored in the storage by the comparison calculation unit, and extracting a failure by comparing the predetermined threshold value with the comparison signal by the failure decision unit is provided, wherein the optimum value of the irradiation energy is stored in the data base inside the device beforehand according to the structure of a sample and a recommended value of the irradiation energy suited to inspection can be searched for by inputting or selecting the irradiation energy by a user or inputting information regarding the structure of an article to be inspected.
申请公布号 US2003206027(A1) 申请公布日期 2003.11.06
申请号 US20030430188 申请日期 2003.05.07
申请人 HITACHI, LTD. 发明人 NOZOE MARI;SHINADA HIROYUKI;WATANABE KENJI;SAIKI KEIICHI;SUGIMOTO ARITOSHI;MORIOKA HIROSHI;TANAKA MAKI;MIYAI HIROSHI
分类号 G01R31/302;G01Q30/04;G01Q30/20;G01R31/307;G09G3/00;(IPC1-7):G01R31/305 主分类号 G01R31/302
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