发明名称 PROCESS FOR FORMING A PATTERNED THIN FILM CONDUCTIVE STRUCTURE ON A SUBSTRATE
摘要 <p>A process for forming a patterned conductive structure on a substrate is disclosed. A pattern is printed with a material, such as a masking coating or an ink, on the substrate, the pattern being such that, in one embodiment, the desired conductive structures will be formed in the areas where the printed material is not present, i.e. a negative image of conductive structure to be formed is printed. In another embodiment, the pattern is printed with a material that is difficult to strip from the substrate, and the desired conductive structures will be formed in the areas where the printed material is present, i.e. a positive image of the conductive structure is printed. The conductive material is deposited on the patterned substrate, and the undesired area is stripped, leaving behind the patterned electrode structures.</p>
申请公布号 WO2003091788(P1) 申请公布日期 2003.11.06
申请号 US2003012692 申请日期 2003.04.23
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