发明名称 WINDOW TYPE PROBE, PLASMA MONITORING DEVICE, AND PLASMA PROCESSING DEVICE
摘要 A window type probe, a plasma monitoring device, and a plasma processing device, the probe capable of directly and conveniently detecting the state of plasma generated by the application of a high frequency or a high voltage, comprising at least a conductive support member (5) having an opening part at least partly in the surface thereof opposed to the plasma and a dielectric member (1) having a probe electrode (2) on one surface thereof, wherein the dielectric member (1) is installed in the opening part of the conductive support member (5).
申请公布号 WO03092059(A1) 申请公布日期 2003.11.06
申请号 WO2003JP04016 申请日期 2003.03.28
申请人 JAPAN SCIENCE AND TECHNOLOGY CORPORATION;YASAKA, MITSUO 发明人 YASAKA, MITSUO
分类号 H05H1/00;C23C14/34;C23C16/52;H01J37/32;H01L21/205;H01L21/3065;(IPC1-7):H01L21/205 主分类号 H05H1/00
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