RESIST STRIPPING SOLUTION

摘要

PROBLEM TO BE SOLVED: To provide a resist stripping solution excellent in resist and etching polymer removing performance, less liable to corrode a substrate material and excellent also in storage stability. SOLUTION: The resist stripping solution contains water-soluble anionic functional group-containing polymers including a copolymer of a structural unit (I) derived from a 3-6C monocarboxylic monoethylenically unsaturated monomer (a) and/or a monoethylenically unsaturated monomer (b) other than the monomer (a). COPYRIGHT: (C)2004,JPO