| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure method capable of averting the insufficiency of exposure power by the influence of standing waves and a method for manufacturing a master disk for manufacturing an optical recording medium by using the same. SOLUTION: A layer 11 of a second refractive index is formed on a base material 10 of a first refractive index and a photoresist layer 12 of a third refractive index is formed on the layer 11 of the second refractive index. Next, the photoresist layer 12 is patterned and exposed with light EX of a prescribed wavelength. Such configuration that the second refractive index at the prescribed wavelength is more approximate to the third refractive index than the first refractive index is employed. A photoresist film of the second refractive index is formed on the base material of the first refractive index and is patterned and exposed with the light of the prescribed wavelength. The light of such a wavelength at which the difference between the first refractive index and the second refractive index attains≤0.3 is used. COPYRIGHT: (C)2004,JPO
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