发明名称 Multilayer structure used especially as a material of high relative permittivity
摘要 Multilayer structure, used especially as a material of high relative permittivity, characterized in that it comprises a plurality of separate layers, each having a thickness of less than 500 Å. Some of those layers are based on aluminium, hafnium and oxygen and especially based on hafnium dioxide (HfO2) and on alumina (Al2O3). In practice, the hafnium dioxide and alumina layers form alloys of formula HfxAlyOz. Advantageously, the stoichiometry of the HfxAlyOz varies from one layer to another. Some of the layers containing HfxAlyOz alloys, or some of the layers between those containing HfxAlyOz alloys, also include a lanthanide element.
申请公布号 US2003207097(A1) 申请公布日期 2003.11.06
申请号 US20030425415 申请日期 2003.04.29
申请人 MEMSCAP LE PARC TECHNOLOGIQUE DES FOUNTAINES 发明人 GIRARDIE LIONEL
分类号 C23C16/40;C23C16/44;C23C16/455;H01L21/28;H01L21/316;H01L29/51;(IPC1-7):B32B9/00 主分类号 C23C16/40
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