发明名称 MANUFACTURING METHOD OF PROBE, MASK FOR MANUFACTURING PROBE AND PROBE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a probe capable of securing sure conduction with a conductive pad. SOLUTION: This method has a process for applying photoresists 500 on both the surface and the back on a plate raw material 400 having conductivity to be processed into the probe 100, a process for masking a first mask 200 on one surface of the plate raw material 400 and a second mask 300 on the other surface respectively, a process for performing exposure and development of the photoresists 500, and a process for etching the plate raw material 400 by using residual photoresists 500 in the process for performing the exposure and the development as masking material 510. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003315361(A) 申请公布日期 2003.11.06
申请号 JP20020127053 申请日期 2002.04.26
申请人 JAPAN ELECTRONIC MATERIALS CORP 发明人 MORI CHIKAOMI
分类号 G01R1/067;G01R1/073;G01R3/00;G01R31/28;H01L21/66;(IPC1-7):G01R1/067 主分类号 G01R1/067
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