| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for the formation of a diffusion reflective base layer having high adhesiveness with a substrate even in a high temperature and high humidity environment, giving excellent reliability as a liquid crystal display device and having high transfer property of the photosensitive resin layer to a transfer substrate with high yield, and to provide a method for manufacturing a diffusion reflector for a reflection type liquid crystal display device by using the above composition. <P>SOLUTION: In the photosensitive element for the formation of a diffusion reflective base layer by depositing a layer of a photosensitive resin composition on a rugged surface of a temporary supporting body having a rugged pattern, the photosensitive resin composition for the formation of a diffusion reflective base layer contains: (I) an unsaturated group-containing acrylic polymer (c) having 0.5 to 1.5 unsaturated groups per 1,000 molecular weight obtained by the reaction of (a) an acrylic resin obtained from methacrylic acid and 5 to 25 wt% of alkylacrylate as the essential component for the copolymer component and (b) a compound having an epoxy group and an unsaturated bond in the molecule; (II) a photopolymerizable compound having at least two ethylenic unsaturated groups; and (III) a photopolymerization initiator. <P>COPYRIGHT: (C)2004,JPO |
