发明名称 METHOD FOR MANUFACTURING TRANSPARENT CONDUCTIVE FILM
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a transparent conductive film which can achieve high durability and high electromagnetic wave shielding properties when the film is used as a filter for shielding the electromagnetic wave and to provide the transparent conductive film. SOLUTION: The method for manufacturing the transparent conductive film by using a film forming unit having a plurality of film forming chambers partitioned by partition walls and each independently controllable of its atmosphere comprises the steps of: repeatedly laminating once to five times as a repeating unit (B)/(C) of a transparent conductive layer made of a high refractive index transparent thin film layer (B) made of a metal oxide or a metal sulfide on one main surface of a transparent base (A) and a metal thin film layer (C) containing at least silver; and further forming a high refractive index transparent thin film layer thereon. In this method, at least one layer of the layer (B) is formed by dividing into twice or more in the two or more film forming chambers. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003313651(A) 申请公布日期 2003.11.06
申请号 JP20020122361 申请日期 2002.04.24
申请人 MITSUI CHEMICALS INC 发明人 ASAKAWA YUKINORI;KIKKAI MASAAKI;OKADA SATORU
分类号 G02B1/10;B32B7/02;B32B9/00;C23C14/06;C23C14/34;H01B5/14;H01B13/00;H05K9/00;(IPC1-7):C23C14/06 主分类号 G02B1/10
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