发明名称 PHOTOCURABLE RESIN COMPOSITION AND CURING METHOD
摘要 PROBLEM TO BE SOLVED: To obtain a photocurable resin composition which minimizes the VOC issue, is water-swellable and water-developable, and gives a cured material with excellent electric properties and to provide a curing method for the composition. SOLUTION: (1) The photocurable resin composition comprises (A) a photopolymerizable resin containing an acidic group, (B) a photopolymerizable resin having a polymerizable unsaturated group and an onium salt, (C) a reactive monomer, and (D) a photopolymerization initiator. (2) The photocurable resin composition is the one described in (1) in which the acid value of (A) is 30-500 mgKOH/g, and the compounding ratio of (A) to (B) is 50:50-10:90. The photocurable resin composition described in (1) or (2) is applied and cured by light treatment and/or heat treatment. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003313211(A) 申请公布日期 2003.11.06
申请号 JP20020118183 申请日期 2002.04.19
申请人 TOYOBO CO LTD 发明人 NAGAHARA SHIGENORI;YAMADA TAKATOSHI;IMAHASHI SATOSHI
分类号 C08F2/44;C08F290/06;C08F291/00;(IPC1-7):C08F2/44 主分类号 C08F2/44
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