发明名称 |
Charged particle beam control element, method of fabricating charged particle beam control element, and charged particle beam apparatus |
摘要 |
An inspection method using an electron beam. Emitted charged particles from an electron gun located inside a primary column are accelerated to form a primary beam. A cross section of the primary beam is shaped a desired shape by a primary optical system located inside the primary column. A trajectory of the primary beam is deflected using a primary deflector located inside the primary column. A sample is illuminated using the primary beam, the sample being on a stage to which a retarding voltage is applied. At least one of secondary electrons, reflected electrons or backwardly scattered electrons that are emerging from the sample on the stage are accelerated toward a second column to form a secondary beam. A trajectory of the secondary beam is deflected using a secondary deflector located inside the secondary column. The secondary beam is guided to a detector located inside the secondary column.
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申请公布号 |
US2003205668(A1) |
申请公布日期 |
2003.11.06 |
申请号 |
US20030396559 |
申请日期 |
2003.03.26 |
申请人 |
NIKON CORPORATION |
发明人 |
OKUBO YUKIHARU |
分类号 |
G01Q30/02;H01J37/12;H01J37/147;(IPC1-7):G01N23/225 |
主分类号 |
G01Q30/02 |
代理机构 |
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代理人 |
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