| 摘要 |
<p>A window type probe, a plasma monitoring device, and a plasma processing device, the probe capable of directly and conveniently detecting the state of plasma generated by the application of a high frequency or a high voltage, comprising at least a conductive support member (5) having an opening part at least partly in the surface thereof opposed to the plasma and a dielectric member (1) having a probe electrode (2) on one surface thereof, wherein the dielectric member (1) is installed in the opening part of the conductive support member (5).</p> |
