发明名称 WOVEN FABRIC FOR POLISHING MAGNETIC DISC
摘要 <P>PROBLEM TO BE SOLVED: To provide a woven fabric for polishing a magnetic disc, enabling a polishing processing by which a more uniform and finer surface roughness Ra is provided to be carried out when carrying out texture processing of the magnetic disc. <P>SOLUTION: The woven fabric for polishing the magnetic disc is obtained by arranging filaments each with a multilobal cross section mainly as the weft on the surface. As a result, the magnetic disc substrate having the uniform small roughness Ra of &le;10 &angst; is obtained by the slurry taken into the groove parts of the filaments with the multilobal sections and spaces formed by the multilobal filaments by arranging the many multifilament yarns comprising the filaments having the multilobal sections and substantially no torque as the wefts. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2003313744(A) 申请公布日期 2003.11.06
申请号 JP20020123690 申请日期 2002.04.25
申请人 TORAY IND INC 发明人 KIYOMURA ETSUO;ABE WATARU;TAKAHASHI KOSHI
分类号 B24B1/00;B24B37/20;B24B37/24;D01D5/253;D03D1/00;D03D15/00 主分类号 B24B1/00
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