摘要 |
<P>PROBLEM TO BE SOLVED: To provide a woven fabric for polishing a magnetic disc, enabling a polishing processing by which a more uniform and finer surface roughness Ra is provided to be carried out when carrying out texture processing of the magnetic disc. <P>SOLUTION: The woven fabric for polishing the magnetic disc is obtained by arranging filaments each with a multilobal cross section mainly as the weft on the surface. As a result, the magnetic disc substrate having the uniform small roughness Ra of ≤10 Å is obtained by the slurry taken into the groove parts of the filaments with the multilobal sections and spaces formed by the multilobal filaments by arranging the many multifilament yarns comprising the filaments having the multilobal sections and substantially no torque as the wefts. <P>COPYRIGHT: (C)2004,JPO |