| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a deep-UV resist material having higher sensitivity and to provide a method of manufacturing an inkjet recording head capable of forming a higher productivity finer nozzle structure by using the resist material. <P>SOLUTION: The resist material comprises a high molecular compound represented by formula (I) wherein R<SB>1</SB>and R<SB>2</SB>are each independently H or alkyl; R<SB>3</SB>and R<SB>4</SB>are each independently alkyl; and m and n are each a positive integer. <P>COPYRIGHT: (C)2004,JPO |
