发明名称 High-resistivity metal in a phase-change memory cell
摘要 The invention relates to lower electrode in a chalcogenide memory device. The lower electrode is a metal compound that includes at least one of nitrogen and silicon. Embodiments include refractory meta nitride, a refractory metal silicon nitride, and refractory metal silicide.
申请公布号 US2003205720(A1) 申请公布日期 2003.11.06
申请号 US20030421071 申请日期 2003.04.22
申请人 CHIANG CHIEN 发明人 CHIANG CHIEN
分类号 H01L21/768;H01L27/24;H01L29/68;H01L45/00;(IPC1-7):H01L29/74 主分类号 H01L21/768
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