发明名称 |
Ion source and coaxial inductive coupler for ion implantation system |
摘要 |
An ion source is disclosed having an elongated slit for providing a ribbon ion beam for use in an ion implantation system. The source comprises a coaxial inductive coupling antenna for RF excitation of plasma within a cylindrical source housing, as well as circumferential magnets disposed within the housing for generating azimuthal multi-cusped magnetic fields for plasma confinement. Also disclosed is a liner for the housing interior providing thermal barrier between the plasma and the outer housing wall so as to mitigate or reduce condensation within the plasma confinement chamber.
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申请公布号 |
US2003205680(A1) |
申请公布日期 |
2003.11.06 |
申请号 |
US20020209397 |
申请日期 |
2002.07.31 |
申请人 |
BENVENISTE VICTOR M.;DIVERGILIO WILLIAM F. |
发明人 |
BENVENISTE VICTOR M.;DIVERGILIO WILLIAM F. |
分类号 |
H01J27/16;G21K5/04;H01J27/00;H01J27/06;H01J37/00;H01J37/04;H01J37/08;H01J37/317;(IPC1-7):H01J27/16 |
主分类号 |
H01J27/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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