发明名称 Method and apparatus for improving adhesion between layers in integrated devices
摘要 In an integrated device, a via is formed in a substrate layer and a barrier layer is formed on the substrate layer in the via. A seed layer is formed on the barrier layer in the via. The seed layer includes a first material and a second material. The first material provides an ability for the second material to maintain an adherence to the barrier layer.
申请公布号 US2003207562(A1) 申请公布日期 2003.11.06
申请号 US20020138393 申请日期 2002.05.03
申请人 FAUST RICHARD A.;JIANG QING-TANG;LU JIONG-PING 发明人 FAUST RICHARD A.;JIANG QING-TANG;LU JIONG-PING
分类号 H01L21/3205;H01L21/768;H01L23/532;(IPC1-7):H01L21/476;H01L21/44 主分类号 H01L21/3205
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