| 摘要 |
<p>A non corrosive cleaning composition that is aqueous-based, non-hazardous and will not harm the environment and is useful primarily for removing both fresh and aged plasma etch residues from a substrate. The composition comprises (a) water, and (b) a synergistic combination of at least one tricaboxylic acid and at least one caraboxylic acid. Preferably, the at least one carboxylic acid has a eKa value ranging from 3 to 6. A method for removing etch residues from a substrate. The method includes the steps of (a) providing a substrate with etch residue, and (b) contacting the substrate with a cleaning composition comprising water, and a synergistic combination of at least one tricaboxylic acid and at least one carboxylic acid.</p> |
