SYNTHETIC QUARTZ GLASS FOR OPTICAL MEMBER, PROJECTION EXPOSURE DEVICE, AND PROJECTION EXPOSURE METHOD

摘要

A synthetic quartz glass for optical member is used in an optical device having ArF excimer laser as a light source at energy density of 2 mJ/cm<2>/pulse or below or in an optical device having KrF excimer laser as a light source at energy density of 30 mJ/cm<2>/pulse or below. The synthetic quartz glass for optical member is characterized in that the hydrogen molecule concentration is in a range is equal to or greater than 1 x 10<16> molecules/cm<3> and smaller than 5 x 10<16> molecules/cm<3>.