PHASE SHIFTING MASK, METHOD FOR SETTING THE SAME AND PATTERN FORMING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a means of obtaining a phase shifting mask which widens a process window in pattern formation in an exposure step.

SOLUTION: The phase shifting mask which widens a process window is manufactured by preparing a phase shifting mask having at least two phase shifters used for a multiple exposure method and adjusting the shifting width of the phase shifters according to the width of a light shielding region between the phase shifters.

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