RESIST RESIDUE REMOVER AND CLEANER

摘要

PROBLEM TO BE SOLVED: To provide a resist residue remover and cleaner capable of removing dry etching residue in a semiconductor device manufacturing process and particles and metal impurities on a wafer surface without corroding wiring and gate metals. SOLUTION: The resist residue remover and cleaner is an aqueous solution of pH 0.5-13 containing 0.5-30 mass% phosphoric acid, >0 to 10 mass% hydrochloric acid and 0.5-25 mass%, in total, of one or more amines selected from primary to quaternary amines. COPYRIGHT: (C)2004,JPO