| 摘要 |
PROBLEM TO BE SOLVED: To provide a detergent composition for precision parts, such as silicon wafers, maintaining smoothness of the wafer with a high etching amount, preventing a surfactant from remaining on surfaces of the wafer, and moreover having excellent persistence of a detergent effect. SOLUTION: This detergent composition for the precision parts contains a compound expressed by general formula (1): R-O-(AO)<SB>n</SB>-(CH<SB>2</SB>)<SB>m</SB>COOX äR is a 1-18C straight chain or branched chain alkyl or a 2-18C alkenyl; AO is ethyleneoxy and/or propyleneoxy; X is H, an alkali, [NR'<SB>4</SB>]<SP>+</SP>(R's are each a 1-3C alkyl, and four members of R's are identical to or different from each other) or [HNR"<SB>3</SB>]<SP>+</SP>(R"s are each H or a 1-10C hydrocarbon residue which may be substituted by OH, and three members of R"s are identical to or different from each other); m is 1-3; and n is 0-50}. COPYRIGHT: (C)2004,JPO
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