发明名称 Semiconductor device manufacturing method having a step of applying a copper foil on a substrate as a part of a wiring connecting an electrode pad to a mounting terminal
摘要 A method of manufacturing a semiconductor device is provided. The method comprises a wire-forming step of forming a wiring on a substrate having an electrode pad so as to connect the electrode pad to a mounting terminal. The wire-forming step includes the steps of: applying a metal foil to the substrate by providing an adhesive therebetween; patterning the metal foil into a predetermined pattern so as to form the wiring; and connecting the wiring to the electrode pad electrically.
申请公布号 US2003207574(A1) 申请公布日期 2003.11.06
申请号 US20030443837 申请日期 2003.05.23
申请人 FUJITSU LIMITED 发明人 AIBA YOSHITAKA;SATO MITSUTAKA
分类号 H01L23/52;H01L21/3205;H01L21/60;H01L23/12;H01L23/31;H01L23/48;H01L23/485;(IPC1-7):H01L21/302;H01L21/461 主分类号 H01L23/52
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