Exposure apparatus for irradiating a sensitized substrate

摘要

An exposure apparatus (10) for applying high-intensity, uniform polarized UV irradiation to a sensitized substrate such as an LCD alignment layer. A telecentric projection system (20) projects a uniformized light towards a surface (28) for irradiation. One or more individual light sources (12) can be combined to provide the intensity needed over the area of the surface (28). An integrator (40) with combining structures (42) allows combination of light from multiple light sources (12). A polarizer (18) is provided at one of an alternate number of locations in the exposure illumination path.