| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a photopolymerizable compound which gives a diffuse reflection substrate layer which is excellent, at a high temperature, in the shape retention of an uneven surface diffusing and reflecting light, is excellent in adhesion to a substrate at high temperature and humidity or in photolithography, and therefore enables a diffuse reflection plate for a reflective liquid crystal display to be produced in a high yield; and to provide a method for producing a photosensitive resin composition, a photosensitive element, and a reflective liquid crystal display using the compound. <P>SOLUTION: The photosensitive resin composition comprises (a) a silyl group- containing photopolymerizable unsaturated compound having at least two ethylenic unsaturated groups and at least one hydrolyzable group-containing silyl group, (b) a binder polymer, (c) a photopolymerizable unsaturated compound having at least one ethylenic unsaturated group, and (d) a photopolymerization initiator. The photosensitive element for a diffuse reflection substrate layer is formed on the uneven surface of a temporary support having the uneven surface. A process for manufacturing a diffuse reflection plate for a reflective liquid crystal display using them is provided. <P>COPYRIGHT: (C)2004,JPO |
