发明名称 |
PLASMA CVD DEVICE |
摘要 |
It is an object of the present invention to provide a plasma CVD device in which it is possible to inhibit the formation of particles resulting from the adhesion of reaction by-products of poor adhesive strength around the upper electrode. The plasma CVD device has a vacuum container 200, an upper electrode 210 and a lower electrode 220. The edge of the gas dispersion plate 213 of the upper electrode 210 is formed in the shape of an upturned bowl, the edge of which extends below the upper surface of the treatment substrate W mounted on the substrate-mounting surface 221 of the lower electrode 220.
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申请公布号 |
US2003205202(A1) |
申请公布日期 |
2003.11.06 |
申请号 |
US19980219706 |
申请日期 |
1998.12.23 |
申请人 |
KOKUSAI ELECTRIC CO., LTD. |
发明人 |
FUNAKI KATSUNORI;HIYAMA SHIN |
分类号 |
H05H1/46;C23C16/44;C23C16/455;C23C16/50;C23C16/509;C23C16/54;H01J37/32;H01L21/205;H01L21/31;(IPC1-7):C23C16/00 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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