| 摘要 |
A method for forming, by exposure to a lithographic beam (2), a groove (6) of material, exposed to a predetermined degree, in a surface layer (4) of an essentially flat substrate (3) rotatable about an axis (5), is characterized in that the lithographic beam (2) and the axis (5), during rotation of the substrate (3) about the axis, are controlled relative to each other so that part of the groove (6) is subjected to more than one exposure to the lithographic beam (2), the groove (6) being formed as a sum of said more than one exposure. Moreover, a device and a computer program product with instructions for controlling such a device according to the method are described. |
