发明名称 METHOD FOR MANUFACTURING DEVICE, APPARATUS FOR MANUFACTURING DEVICE, DEVICE AND ELECTRONIC APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method and manufacturing apparatus for a device capable of forming patterns of desired accuracy on respective different material layers if such material layers coexist in pattern forming regions on a substrate. SOLUTION: A first area BM1 consisting of a plurality of first unit regions of a grid form is set on one material layer of the pattern forming regions and a second area (BM2) consisting of a plurality of second unit regions of a grid form is set on the other material layer of the pattern forming regions. A first discharge operation is performed for the first area BM1 and a second discharge operation is performed for the second area BM2. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003311203(A) 申请公布日期 2003.11.05
申请号 JP20020118291 申请日期 2002.04.19
申请人 SEIKO EPSON CORP 发明人 HASEI HIRONOBU
分类号 B41J2/01;B05C5/00;B05C9/06;B05C11/10;B05D1/26;B05D7/00;H01J9/02;H01J11/22;H01J11/34;(IPC1-7):B05D1/26;H01J11/02 主分类号 B41J2/01
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