发明名称 |
METHOD FOR MANUFACTURING DEVICE, APPARATUS FOR MANUFACTURING DEVICE, DEVICE AND ELECTRONIC APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method and manufacturing apparatus for a device capable of forming patterns of desired accuracy on respective different material layers if such material layers coexist in pattern forming regions on a substrate. SOLUTION: A first area BM1 consisting of a plurality of first unit regions of a grid form is set on one material layer of the pattern forming regions and a second area (BM2) consisting of a plurality of second unit regions of a grid form is set on the other material layer of the pattern forming regions. A first discharge operation is performed for the first area BM1 and a second discharge operation is performed for the second area BM2. COPYRIGHT: (C)2004,JPO
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申请公布号 |
JP2003311203(A) |
申请公布日期 |
2003.11.05 |
申请号 |
JP20020118291 |
申请日期 |
2002.04.19 |
申请人 |
SEIKO EPSON CORP |
发明人 |
HASEI HIRONOBU |
分类号 |
B41J2/01;B05C5/00;B05C9/06;B05C11/10;B05D1/26;B05D7/00;H01J9/02;H01J11/22;H01J11/34;(IPC1-7):B05D1/26;H01J11/02 |
主分类号 |
B41J2/01 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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