| 摘要 |
PROBLEM TO BE SOLVED: To prevent metal layers of a beam structure of a mechanism device having a metallic multi-layered structure formed by using a micromachine technology from warping by relieving residual stress and to provide the device at advantageous cost. SOLUTION: In the multi-layered structure part of a beam part 31b of a cantilever beam structure 31, a nickel layer 32a, and an anti-etching layer 32b, the nickel layer 32a is covered with a metal layer (beam part 31b) and a metal layer (anti-etching layer 32b), and the upper face side of the metal layer (anti- etching layer 32b) is formed to be thicker than the metal layer (beam part 31b). Each of the layers is formed using a photolithographic method and an electrolytic plating method. COPYRIGHT: (C)2004,JPO
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