发明名称 PLASMA TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus of which the cover case can easily be cleaned. SOLUTION: The plasma treatment apparatus comprises a lower part electrode 3, a cover case 10 covering over the lower part electrode 3 in a freely openable and closable manner, a gas supply part 12 for supplying a gas for plasma generation to a treatment chamber 11 in the cover case 10, and a vacuum pump 15 for vacuum-evacuating the treatment chamber 11 and which carries out plasma treatment of surface of a work 4 in the treatment chamber 11. The inner surface of the cover case 10 is made specular by sticking a glass plate 7 or the like. Accordingly, the cover case 10 can easily be cleaned by opening the cover case 10, wiping the inner surface of the cover case 10 and removing particles adhering to the inner surface of the cover case 10. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003311145(A) 申请公布日期 2003.11.05
申请号 JP20020120420 申请日期 2002.04.23
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 FURUKAWA RYOTA;KORENAGA TETSUO;NAGATOME RYUJI;IWAI TETSUHIRO;YOSHIDA NAOHITO
分类号 B08B7/00;B01J19/00;B01J19/08;(IPC1-7):B01J19/08 主分类号 B08B7/00
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