发明名称 Etched article and method of etching
摘要 A substrate is marked by applying a high melting point material over a lower surface of the substrate, and then heating the material layer. Indicia are formed by directing a source of radiant energy through the substrate for impingement on the material layer, and by moving the source and/or the substrate relative to each other.
申请公布号 US6642475(B2) 申请公布日期 2003.11.04
申请号 US20010948246 申请日期 2001.09.07
申请人 BENDERLY DAVID 发明人 BENDERLY DAVID
分类号 B41M5/26;(IPC1-7):B23K26/00 主分类号 B41M5/26
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