| 摘要 |
PURPOSE: A photocurable resin composition having a permanent antistatic property is provided, to improve the abrasion resistance, the transmittance and the hardness and to reduce the shrinkage. CONSTITUTION: The photocurable resin composition comprises 100 parts by weight of an acrylate oligomer; 5-200 parts by weight of an acrylate monomer having four or less functional groups; 0.1-10 parts by weight of a photopolymerization initiator; 1-8 parts by weight of a hardness enhancer represented by the formula 1; 1-10 parts by weight of meth-terphenyl represented by the formula 2; and 5-30 parts by weight of a colloidal antistatic composition. Preferably the colloidal antistatic composition comprises at least one selected from the group consisting of tin oxide, antimony-tin oxide, antimony-zinc oxide, indium-tin oxide, zinc oxide, aluminium-zinc oxide, titanium oxide, tungsten oxide, molybdenum oxide, vanadium oxide and iron oxide. |
