发明名称 SUBSTRATE DISCHARGING DEVICE AND VACUUM TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a technique for stably and repeatedly electrostatically attracting a substrate at the time of performing treatment in a vacuum. SOLUTION: This substrate discharging device for removing electric charges remaining in the substrate in a vacuum comprises an airtight cassette chamber 3 constituted so as to introduce prescribed gas 50 for discharging for housing the substrate 20 to be discharged and an ultraviolet ray irradiation means 60 for irradiating the gas 50 for discharging introduced to the cassette chamber 3 with ultraviolet rays 62. Consequently, even when electrostatic attraction is repeated, the residual electric charges are not accumulated in the substrate 20. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003309157(A) 申请公布日期 2003.10.31
申请号 JP20020113471 申请日期 2002.04.16
申请人 ULVAC JAPAN LTD 发明人 MAEHIRA KEN;FUWA KO
分类号 H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/677
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