发明名称 METHOD OF MANUFACTURING BASIC MATERIAL OF CONDUCTIVE PATTERN
摘要 PROBLEM TO BE SOLVED: To overcome the problem of stability of a basic material obtained deteriorating, if a reactive layer is left on the basic material, when the conductive pattern is formed with an additive method. SOLUTION: The basic material of conductive pattern which does not include an optical catalyst can be manufactured through the formation of a wettable pattern by overlapping an optical catalyst basic material 4, where an optical catalyst layer 6 is laminated on a second basic material 5, on a wettability variable basic material 1, where a wettability variable layer 3 is laminated on a first basic material 2 and then exposing the pattern and through adhesion of a conductive coating solution or the like. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003309344(A) 申请公布日期 2003.10.31
申请号 JP20020115961 申请日期 2002.04.18
申请人 DAINIPPON PRINTING CO LTD 发明人 KOBAYASHI HIRONORI;YAMASHITA TAKEHIRO
分类号 G02F1/1343;B01J35/02;G02F1/1345;G03F7/00;G03F7/075;G03F7/09;G03F7/26;H01B13/00;H05K3/04;H05K3/10;H05K3/12;(IPC1-7):H05K3/10;G02F1/134 主分类号 G02F1/1343
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