PRODUCTION METHOD FOR RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a production method for a high definition resist pattern at the time of using chemical amplification type resist and a conductive film.

SOLUTION: The manufacturing method for the resist pattern comprises: the irradiation process of irradiating a base material having a chemical amplification type resist layer and the conductive film formed on the chemical amplification type resist layer for discharging acid by heating on one surface with electron beams in a pattern shape from the conductive film side; the conductive film removal process of removing the conductive film from a substrate irradiated with the electron beams; the post-exposure baking process of executing post- exposure baking of the substrate from which the conductive film is removed; and the development process of performing development on the substrate to which the post-exposure baking is executed and forming a pattern composed of the chemical amplification type resist.

COPYRIGHT: (C)2004,JPO