| 摘要 |
PROBLEM TO BE SOLVED: To solve the problem that various optical members for composing an illumination system, a projection optical system, or the like in a projection aligner may physically interfere one another when making compact the entire projection aligner to some extent, since a reflection mask is used and the illumination and projection optical systems are arranged at the same side to the reflection type mask in the conventional EUV compact projection aligner. SOLUTION: In the projection aligner, the reflection mask is illuminated with light from a light source, and the pattern of the illuminated reflection mask is projected onto a substrate by the projection optical system. In this case, light with which the reflection mask is illuminated passes between optical members in the projection optical system. COPYRIGHT: (C)2004,JPO |
