| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam control device for controlled use of an electron beam, such as an electron microscope or an electron beam aligner, that protects a track of an electron beam from an adverse influence of an externally influenced magnetic variation. SOLUTION: The electron beam control device for controlled use of an electron beam, such as an electron microscope or an electron beam aligner, comprises a magnetic sensor for measuring an externally influenced magnetic variation that influences a track of an electron beam. COPYRIGHT: (C)2004,JPO
|
