Compensating scatter/reflection effects in particle lithography involves writing frame in particle-sensitive material around pattern area so background dose variations are below 30 per cent of maximum

摘要

The method involves providing at least one coating of particle-sensitive material, writing defined patterns (20) into a limited area (21) of the particle-sensitive material using at least one particle beam and writing a frame (22) in the particle-sensitive material around the limited area so that variations in background dose within the area are smaller than 30 per cent of the maximum background dose within the area.