| 摘要 |
<p>A semiconductor processing system (2) comprising a flow-rate measuring unit (6) for inspecting flow-rate controllers (38A-38E) that control process-gas flow rates. The flow-rate measuring unit (6) has an inspection container (54) having a specified capacity and being disposed on a gas bypass line (52) for connecting a gas supply line (30) with an exhaust line (22) so as to bypass a processing chamber (8), with a pressure gage (58) disposed to detect pressure in the container (54). A flow-rate computing unit (64) is disposed to determine gas flow rates at flow-rate controllers based on a pressure rise rate detected by the pressure gage (58). System control units (44, 62) control the step of supplying an inert gas into the container (54) to purge it before or after process gas is fed into the container (54).</p> |
