发明名称 METHODS OF MANUFACTURING THIN-FILM DEVICE AND TRANSISTOR, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC EQUIPMENT
摘要 <p>A manufacturing method for forming a thin-film device having multiple layers on a base material, comprising the step of forming at least one layer of the plurality of layers, the step characterized by further comprising the steps of moving the relative position of a nozzle for jetting liquid material containing the components of the one layer to the base material and jetting the liquid material from the nozzle toward the base material, wherein the liquid material is jetted from the nozzle in a film forming chamber (110) to apply the liquid material on the base material so as to form a thin-film, and the base material is heat-treated in a first heat treating part (103A) and a second heat treating part (103B), whereby the crystallization and compactness of the film and the adhesion of the film to the other film can be increased.</p>
申请公布号 WO2003090266(P1) 申请公布日期 2003.10.30
申请号 JP2003005055 申请日期 2003.04.21
申请人 发明人
分类号 主分类号
代理机构 代理人
主权项
地址