发明名称 |
OPTICAL ELEMENT AND MANUFACTURING METHOD THEREFOR |
摘要 |
An optical element and a manufacturing method therefor, an exposure apparatus, and a device manufacturing method that can reduce the effect of intrinsic birefringence under high NA conditions. According to an optical element as one aspect of the present invention, an angle between a [0 0 1] axis of an isometric crystal and an optical axis is less than 10 DEG , and preferably 0 DEG . |
申请公布号 |
WO03003072(A3) |
申请公布日期 |
2003.10.30 |
申请号 |
WO2002JP05952 |
申请日期 |
2002.06.13 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
TAKEUCHI, SEIJI;UNNO, YASUYUKI |
分类号 |
C30B11/00;C30B29/12;G02B1/02;G02B13/00;G03F7/20;H01L21/027 |
主分类号 |
C30B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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