发明名称 |
Arrangement and method for transferring a pattern from a mask to a wafer |
摘要 |
An arrangement for transferring a pattern from a mask (100) onto a wafer is provided. A product area (110) of the mask (100) is at least partly surrounded by a frame (112) having an alignment mark area (114). In order to avoid the need to produce a specific mask set for different alignment styles, the mask (100) and the frame (112) are designed as being separate units. Further, methods for transferring a pattern from a mask to a wafer are provided that employ a frame separated from a product area.
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申请公布号 |
US2003202181(A1) |
申请公布日期 |
2003.10.30 |
申请号 |
US20020135463 |
申请日期 |
2002.04.30 |
申请人 |
MALTABES JOHN GEORGE;CHARLES ALAIN BERNARD;MAUTZ KARL E. |
发明人 |
MALTABES JOHN GEORGE;CHARLES ALAIN BERNARD;MAUTZ KARL E. |
分类号 |
G03F1/14;G03F9/00;(IPC1-7):G01B11/00 |
主分类号 |
G03F1/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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