发明名称 Defect-free semiconductor templates for epitaxial growth and method of making same
摘要 A method for fabrication of defect-free epitaxial layers on top of a surface of a first defect-containing solid state material includes the steps of selective deposition of a second material, having a high temperature stability, on defect-free regions of the first solid state material, followed by subsequent evaporation of the regions in the vicinity of the defects, and subsequent overgrowth by a third material forming a defect-free layer.
申请公布号 US2003203531(A1) 申请公布日期 2003.10.30
申请号 US20030456377 申请日期 2003.06.06
申请人 SHCHUKIN VITALY;LEDENTSOV NIKOLAI 发明人 SHCHUKIN VITALY;LEDENTSOV NIKOLAI
分类号 H01L21/205;C30B25/18;H01L21/20;H01L21/203;H01L21/324;H01L25/00;H01L33/00;H01S5/02;H01S5/187;H01S5/32;H01S5/323;(IPC1-7):H01L21/00;C30B1/00;H01L21/36 主分类号 H01L21/205
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