| 摘要 |
Aspects of the present invention include a non-metal, a hydrogen absorbing metal, a selected isotope to be exposed to ions of hydrogen or ions of isotopes of hydrogen, and a hydrogen source. The hydrogen source can be an electrolytic solution, a gas or plasma. In some embodiments the hydrogen absorbing metal covers the non-metal to form a microsphere. The hydrogen absorbing metal is positioned to contact the hydrogen source. Further, the hydrogen absorbing metal can be made of multiple layers of dissimilar metals with different Fermi energy levels. The multiple layers of metals have interfaces where swimming electron layers exist. Interfaces between the non-metal, hydrogen absorbing metal, and the hydrogen source also exist with swimming electron layers. The selected isotope is placed in these regions of swimming electron layers to be exposed to the ions of hydrogen and its isotopes from the hydrogen source.
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