| 发明名称 |
Self-aligned aperture masks having high definition apertures |
| 摘要 |
Self-aligned aperture masks are produced using a positive-acting photoresist (18) which is developed with a liquid developer. The apertures (30) of the mask have lower levels of inter-aperture variability than masks produced using mechanical transfer of toner particles (FIGS. 4-5 and 7-8), both for the apertures of a given mask and between masks.
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| 申请公布号 |
US2003202244(A1) |
申请公布日期 |
2003.10.30 |
| 申请号 |
US20030430179 |
申请日期 |
2003.04.15 |
| 申请人 |
CORNING INCORPORATED |
发明人 |
BRADY MICHAEL D.;GUERMEUR CELINE C.;NEDELEC YANN P. M. |
| 分类号 |
G03B21/62;G02B3/00;G03B21/60;G03F1/00;G03F7/004;(IPC1-7):G03B21/60;G03F5/00;G03F7/20;H04N9/31;H04N5/64;G03F7/30 |
主分类号 |
G03B21/62 |
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